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Sony Electronics Announces the Highly Anticipated FE 85mm F1.4 G Master™ II Lightweight Telephoto Portrait Lens

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A Next-Generation Full-Frame E-Mount Lens Offering Significant Resolution, Size, and Autofocus Upgrades

SAN DIEGO, Aug. 28, 2024 /PRNewswire/ — Sony Electronics introduces the FE 85mm F1.4 GM II (SEL85F14GM2), a premium lens that delivers high resolution, smooth bokeh, and fast AF (autofocus) in a lightweight and compact body. As a second-generation model, it builds on the optical design of its predecessor and incorporates Sony’s latest G Master™ technologies to enhance overall performance. This is the 76th E-Mount lens and is designed to take full advantage of the features in Sony’s latest Alpha™ series full-frame cameras. As a large-aperture, telephoto prime, this lens is an ideal option for portraiture, wedding, travel, and cinematic video.

“The first-generation 85 mm F1.4 lens was one of three lenses in the initial G Master series launch back in 2016. Since then, our engineers have refined eight years of lens technology to decrease size and increase performance for our new flagship 85 mm,” said Yang Cheng, Vice President, Imaging Solutions, Sony Electronics Inc. “We are excited to introduce this highly anticipated lens for many photographers and cinematographers in our community.”

High Optical Performance and Beautiful Bokeh

The refined optical design and advanced elements of the FE 85mm F1.4 GM II bring together smooth bokeh and enhanced high resolution, making it ideal for portrait photography. The lens offers advanced optics with two XA (extreme aspherical) and two ED (extra-low dispersion) elements designed to effectively suppress aberrations. This combination offers corner-to-corner resolution and rendering, resulting in outstanding image quality.

The FE 85mm F1.4 GM II also includes Sony’s original Nano AR Coating II technology, which effectively subdues flare and ghosting for clear, crisp images. Alongside, the 11-blade circular aperture of this lens produces the beautiful, soft bokeh that G Master lenses are known for.

Fast, Precise Autofocus and Subject Tracking

The AF capabilities of the next generation FE 85mm F1.4 GM II have drastically improved to maximize performance for its use cases like portrait photography and cinematic video. For stills, the AF is up to three times fasteri compared to the previous modelii, allowing users to accurately track moving subjects with high speed. In addition, subject tracking performance has improved by as much as seven timesii. With these improvements, this is a lens that can enable features on Sony’s latest camera bodies, including continuous shooting of up to 120fpsiii  on the Alpha 9 III.

Lightweight Design Without Compromises

Compared to the original 85mm F1.4 G Master, the weight of this next generation is about 20% lighteriv and 13% smaller in volume (approx. 642 grams, 22.7 oz), which is achieved through the latest mechanical technology and optical design. The FE 85mm F1.4 GM II has a filter diameter of φ77 mm, diameter of 84.7mm (about 3 3/8 in) and length of 107.3mm (about 4 1/4 in).

Ideal for Cinematic Content Creation

The large F1.4 aperture and compact size of the FE 85mm F1.4 GM II makes it a fitting lens selection for cinematic movie creation. Internally, the lens has an XD (extreme dynamic) linear motor with internal focusing, quiet AF and linear response MF (manual focus). Focus breathing is minimal, and in-body focus breathing compensationv is supported.

Due to the flexibility offered through Sony’s one-mount E-Mount system, this lens can be used across Sony’s latest mirrorless Alpha cameras, as well as cameras in the Sony Cinema Line, including the Sony BURANO.

Designed to Maximize Operability and Durability

Externally, the FE 85mm F1.4 GM II has two customizable focus hold buttons and an AF/MF switch to offer flexible operability. There is also an independent aperture ring and Linear Response MF focus control button to provide intuitive control and streamline the creative shooting process.

The front lens element features a fluorine coating, which makes it easy to remove fingerprints, dust, oil, and other contaminants from the lens surface. The dust and moisture resistant designvi provides additional reliability for outdoor use in challenging conditions.

Pricing and Availability

The FE 85mm F1.4 GM II will be available in September 2024 for approximately $1,799.99 USD and $2,499.99 CAD. It will be sold at a variety of Sony’s authorized dealers throughout North America.

A product video on the new FE 85mm F1.4 GM II can be viewed here: https://youtu.be/-TiFpUYVCHgXXX 
For detailed product information about the FE 85mm F1.4 GM II, please visit: https://electronics.sony.com/imaging/lenses/full-frame-e-mount/p/sel85f14gm2

Exclusive stories and exciting new content shot with the new FE 85mm F1.4 GM II and Sony’s other imaging products can be found at www.alphauniverse.com, a site created to inform, educate, and inspire content creators.

About Sony Electronics Inc. 

Sony Electronics is a subsidiary of Sony Corporation of America and an affiliate of Sony Group Corporation, one of the most comprehensive entertainment companies in the world, with a portfolio that encompasses electronics, music, motion pictures, mobile, gaming, robotics and financial services. Headquartered in San Diego, California, Sony Electronics is a leader in electronics for the consumer and professional markets. Operations include research and development, engineering, sales, marketing, distribution and customer service. Sony Electronics creates products that innovate and inspire generations, such as the award-winning Alpha Interchangeable Lens Cameras and revolutionary high-resolution audio products. Sony is also a leading manufacturer of end-to-end solutions from 4K professional broadcast and A/V equipment to industry leading 4K and 8K Ultra HD TVs. Visit http://www.sony.com/news. for more information.

i When used on the Alpha 1. Sony tests.
ii Compared to the FE 85MM F1.4 GM. Sony tests
iii Maximum continuous shooting speed may be lower in some conditions. Continuous shooting speed may vary depending on the lens used in the AF-C focus mode. Refer to Sony’s lens compatibility support page for details.
iv Compared to the FE 85MM F1.4 GM. Sony tests.
v Please refer to support page; https://support.d-imaging.sony.co.jp/www/cscs/function/compatibility.php?area=jp&lang=en&cs_ref=slct_lang&fnc=1001
vi Not guaranteed to be 100% dust and moisture proof.

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SOURCE Sony Electronics, Inc.

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Niutech at the Forefront: U.S.-China Circular Economy Forum Tackles “White Pollution”

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BEIJING, Sept. 20, 2024 /PRNewswire/ — On September 6, 2024, the inaugural U.S.-China Circular Economy Cooperation Forum was held in Beijing. The forum, guided by the U.S.-China Climate Action Working Group Circular Economy Task Force, was co-organized by the China Circular Economy Association and the US-China Business Council. The forum brought together approximately 460 distinguished guests from the National Development and Reform Commission of China, the Ministry of Foreign Affairs, the Ministry of Industry and Information Technology, the Ministry of Ecology and Environment, the Ministry of Housing and Urban-Rural Development, the Ministry of Commerce, the General Administration of Market Regulation, the US State Department, the US Department of Energy and other government departments, as well as industry experts, business representatives and scientific research institutions of the two countries. As the domestic leader in continuous pyrolysis technology, Niutech was invited by the China Circular Economy Association to attend the forum and gave an insightful speech on the topic of waste plastic recycling, and the issues of ‘white pollution’ that can result from it.

Enhancing Quality and Efficiency in the Circular Economy with Innovative Forces

The forum was strategically designed to advance the goals outlined in the U.S.-China “The Sunnylands Statement on Enhancing Cooperation to Address the Climate Crisis” (hereinafter referred to as the Sunnylands Statement). It aimed to create a collaborative platform for the business community, social organizations, and research institutions from both countries to foster exchanges and drive tangible cooperation in the circular economy.  

Zhao Chenxin, Deputy Director of the National Development and Reform Commission, John Podesta, Senior Advisor to the U.S. President on International Climate Policy, Liu Zhenmin, China’s Special Envoy for Climate Change Affairs, Nicholas Burns, U.S. Ambassador to China, and Xie Zhenhua, former Special Envoy for Climate Change Affairs of China, attended the opening ceremony of the Forum and delivered a speech, and Xie Feng, Chinese Ambassador to the U.S., made a video message. Deputy Director Zhao Chenxin said that addressing climate change is a common cause for all mankind and cannot be separated from the cooperation between the two global forces, China and the United States.

The China-US Circular Economy Cooperation Forum, held as an initiative to implement the Sunnylands Statement, marked another significant milestone in China-US cooperation on the circular economy. This collaboration is crucial for both nations as they join forces to tackle the climate crisis. On the afternoon of September 6, the forum organized four parallel meetings, where representatives engaged in in-depth exchanges on topics such as using the recycling economy to reduce greenhouse gas emissions, promoting the application of recycled materials, addressing plastic pollution and enhancing recycling, and increasing the recycling value of waste in the context of new industries and consumption patterns.

Niutech: International Experts on Continuous Pyrolysis Technology and Pioneers in solving the global “white pollution” problem

Globally, hundreds of millions of tons of waste plastics are generated annually, yet only about 30% undergo recycling. Traditional physical methods are typically limited to high-value, single-category, and relatively clean waste plastics. However, repeated recycling can degrade the quality of the plastics. Chemical recycling, on the other hand, offers a transformative approach by converting waste plastics into high-value products or fuels through chemical processes, thus overcoming the limitations of physical recycling.

Pyrolysis technology, a cornerstone of chemical recycling, addresses the challenges associated with the material recycling of waste plastics. It is adept at processing various types of low-value, mixed, and contaminated waste plastics. The products of pyrolysis can be further processed to manufacture new plastics, achieving a closed-loop system where waste plastics are repurposed into high-value new plastics. This not only retains the material’s utility at a high level but also converts “white pollution” into a “white oil field,” signifying a major shift in the management and valorization of plastic waste.

At the forum, as the international expert in continuous pyrolysis technology, the corporate representative of Niutech shared the cases of waste plastic chemical recycling projects deployed with international giants BASF and Quantafuel in Denmark, Thailand and other countries. Niutech has developed its own pyrolysis technology and equipment, which they fully own the intellectual property rights to. This technology enables the transformation of low-value, mixed, and contaminated waste plastics—including various polymers such as PP, PE, PS, ABS—into high-quality fuel oil.  

The fuel oil derived from this process can undergo further refining into naphtha, a critical raw material in the production of new plastics. This advanced recycling process not only diverts plastics from landfills and the environment but also contributes to a circular economy by turning waste into a valuable resource.

In the future, Niutech will continue to champion the principle of “green, recycling and low-carbon” waste plastics pyrolysis. Armed with advanced technology, reliable equipment, abundant high-value solutions and proven experience, Niutech is committed to enhancing communication and cooperation with domestic and foreign partners. Together, they will drive forward the chemical recycling of waste plastics and the sustainable development of the global waste plastics recycling industry.

 

View original content to download multimedia:https://www.prnewswire.com/news-releases/niutech-at-the-forefront-us-china-circular-economy-forum-tackles-white-pollution-302254665.html

SOURCE Niutech

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Global Ultrasound Institute Launches GUSI Fellowships Platform: Elevating Point-of-Care Ultrasound Education

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SAN FRANCISCO, Sept. 20, 2024 /PRNewswire/ — The Global Ultrasound Institute (GUSI) is proud to announce the launch of the GUSI Fellowships Platform, an innovative online platform designed to empower learners around the world to achieve confidence and competency in point-of-care ultrasound (POCUS). With a holistic, device-independent approach that includes comprehensive evidence-based education, personalized mentorship from world-class POCUS educators, detailed scan review feedback, quantitative assessments, and CME certification, GUSI is setting a new standard in POCUS education.

“GUSI’s online didactics are the best that I have seen. And what I like most about the fellowship were the 1:1 sessions and being able to interact with GUSI expert faculty who have many years of experience in POCUS. And you get to pick their brains and they get to instruct you 1:1. I have used the training I received from GUSI to do much more POCUS clinically and further impact my patients lives.”

Dr. James Wilcox,
Assistant POCUS Director, Indiana University School of Medicine
Adjunct Professor and Assistant Professor of Medicine

“Our mission at GUSI is to democratize access to high-quality ultrasound training,” said Dr. Kevin Bergman and Dr. Mena Ramos, Co-CEOs of Global Ultrasound Institute. “The GUSI Fellowships Platform enables learners from diverse backgrounds to enhance their skills in a supportive, flexible environment, making it easier than ever to reach their POCUS goals.”

With training options covering 38 different scan types, learners can expect personalized 1:1 mentorship with expert POCUS educators who provide timely feedback on practice scans.

“The GUSI fellowship mentors are the best: patient, kind, knowledgeable, experienced, and supportive. GUSI provided education in the areas I wanted and needed to obtain and in my home/office environment not requiring multiple trips around the country. It is not just the way course work is presented – learning is made easier by the support provided to each student.”

Dr. Glenda Patterson
Core Faculty, University of Arkansas Northwest Internal Medicine Residency
Physician, Veterans Health Care of the Ozarks
Board-certified in Internal Medicine, Pulmonary Medicine, and Critical Care Medicine

The GUSI Fellowships Platform features a scalable software system designed to monitor and track performance, ensuring learners can effectively measure their progress.

GUSI understands the challenges faced by healthcare professionals seeking to enhance their ultrasound skills amid demanding schedules. GUSI addresses these concerns with flexible scheduling options, allowing learners to progress at their own pace while balancing their professional and personal commitments. This adaptability and virtual experience is crucial for fostering a culture of continuous learning and skill development.

“I went from not being able to hold the probe to someone who can scan and diagnosing and finding pathologies. I worked with Dr. Milne-Price and she was amazing! She sharpened my skills and we did sessions of live scanning over Zoom. I feel confident in my skills now to scan on my own.”

Dr. Dalea Al-Hawarri
Faculty, Bryn Mawr Family Medicine Residency

As healthcare continues to evolve, the demand for proficient ultrasound practitioners has never been greater. GUSI is not only committed to providing exceptional education but also aims to inspire a new generation of healthcare professionals who can leverage POCUS to improve patient outcomes globally. Join us in this exciting journey towards excellence in ultrasound practice.

For more information on GUSI Fellowships and to start your journey toward ultrasound proficiency, visit https://globalultrasoundinstitute.com/.

About Global Ultrasound Institute:

Global Ultrasound Institute stands at the forefront of point-of-care ultrasound, providing wraparound education, training, AI, and administrative software tools to healthcare providers and health systems globally to lower barriers to POCUS adoption and implementation. GUSI has trained over 14,000 healthcare practitioners in over 60 countries. GUSI is working to create a better world in which every healthcare practitioner is empowered to offer a rapid, reliable, accurate ultrasound-enabled diagnosis directly at the point-of-care, for any patient, anywhere.

For more information about GUSI Fellowships or any of GUSI services, please visit https://globalultrasoundinstitute.com/

Contact:

Dr. Kevin Bergman, Co-Founder, co-CEO, Global Ultrasound Institute
Dr. Mena Ramos, Co-Founder, co-CEO, Global Ultrasound Institute

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SOURCE GLOBAL ULTRASOUND INSTITUTE

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Keuka College Notifies Individuals of Data Security Incident

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KEUKA PARK, N.Y., Sept. 20, 2024 /PRNewswire/ — Keuka College has learned of a data security incident that may have involved personal information.

On April 25, 2024, the College identified suspicious activity within its network environment and immediately took steps to secure the environment, restore its systems, and began an investigation to determine the nature and scope of the issue. Keuka College also engaged independent cybersecurity specialists to assist with the process. The comprehensive investigation, which concluded on August 21, 2024, could not determine definitively whether personal information related to current and former students and employees was affected.

Keuka College maintains a variety of records which can include: name, Social Security number, Driver’s license number, student id number, financial account information, and date of birth. Current students and employees were contacted by the College in May and provided with one year of free credit and identity monitoring services.

Keuka College has established a toll-free call center to answer questions about the incident and address related concerns. Call center representatives are available Monday through Friday from 9:00 am to 9:00 pm Eastern Time and can be reached at 1-833-913-7557. Please be prepared to provide the engagement number, B131983, for reference.

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SOURCE Keuka College

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