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Synopsys Achieves Certification of its AI-driven Digital and Analog Flows and IP on Samsung Advanced SF2 GAA Process

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Production-Ready Design Flows, Multi-Die Solution, and Synopsys IP Deliver a Proven Path to Unparalleled Power and Performance for AI and HPC Designs

Highlights

Test chip tapeouts validate product readiness of certified digital and analog design flows for Samsung Foundry SF2/SF2Z processCollaboration on design techniques for SF2, including backside power and nanosheet optimization delivers more efficient power distributionSynopsys IP, now available and silicon proven on Samsung SF2, reduces integration risk and accelerates silicon successQualified multi-die design reference flow and UCIe IP for SF2 process accelerates 2.5D/3D heterogeneous integrationExpanded collaboration on Synopsys.ai includes Synopsys ASO.ai for accelerated analog design migration with new analog design migration reference flow for Samsung’s GAA processes

SUNNYVALE, Calif., June 12, 2024 /PRNewswire/ — Synopsys, Inc. (Nasdaq: SNPS) today announced that its AI-driven digital design and analog design flows have achieved certification on Samsung Foundry’s SF2 process with multiple test chip tapeouts. The reference flows, powered by the Synopsys.ai™ full-stack EDA suite, enhance PPA, boost productivity, and accelerate analog design migration for Samsung Foundry’s latest Gate-All-Around (GAA) process technologies. The Samsung SF2 process was optimized using Synopsys’ AI-driven design technology co-optimization (DTCO) solution which delivered significantly superior performance, power, and area (PPA) for the process compared to optimization without the use of AI. Building on this success, the same co-optimization techniques will be applied for Samsung’s advanced SF1.4 process.

“The demand for custom SoCs in the era of pervasive intelligence requires extensive ecosystem collaboration to help customers accelerate their innovation and silicon success on Samsung’s SF2 and next-generation SF1.4 processes,” said Sanjay Bali, vice president of product management and strategy for the EDA Group at Synopsys. “Achieving certification and multiple successful tapeouts of our digital and analog flows, powered by Synopsys.ai, on the SF2 process, combined with proven Synopsys IP provides designers with a trusted path to meeting their aggressive design goals for a faster time to market.”

“Synopsys and Samsung have worked closely for decades to help our mutual customers achieve their most complex design requirements,” said Sangyun Kim, Vice President and head of Foundry Design Technology Team at Samsung Electronics. “This latest collaboration milestone with Synopsys on AI-driven EDA flows and broad IP portfolio development is a testament to our ongoing efforts to address the industry’s growing demand for high performance computing with significant PPA gains. Working together we validated our PPA results using Synopsys’ certified digital flow, achieving 12% higher performance, 25% reduction in power, and 5% area reduction compared to the base design.”

Collaboration on AI-driven EDA Flows
Synopsys and Samsung are closely collaborating on AI-driven flows, including Synopsys DSO.ai™ for design productivity and PPA optimization, and Synopsys ASO.ai™ for faster analog design migration. This collaboration has resulted in a new analog design migration reference flow using Synopsys ASO.ai for Samsung’s FinFET to GAA processes, enabling designers to efficiently migrate Samsung 8nm analog IPs to SF2 process, adding to Synopsys‘ established flows on Samsung’s 14nm to 8nm/SF5 processes.

New Design Techniques and Methodology for Advanced GAA Processes
Synopsys‘ continued innovation helps mutual customers benefit from new design techniques including backside routing, local layout effect-aware methodology, and nanosheet cell design, to help customers meet their design goals for power, performance, and area on Samsung SF2 process family. In addition, integrating backside routing and the super-cell approach using Synopsys‘ digital implementation and signoff tools enables designers to increase transistor performance efficiency and density, optimize power consumption, and reduce area by up to 20% for Samsung’s SF2Z process technology compared to chips without backside routing capabilities. 

Accelerate SoC and Multi-Die Designs
Synopsys IP for Samsung standard and automotive processes from SF2 to SF14LPU delivers a competitive edge for chipmakers looking to reduce integration risk and accelerate time to silicon success for automotive, mobile, high-performance computing (HPC) and multi-die designs. The industry’s broadest portfolio of standards-compliant, silicon-proven interface IP for advanced Samsung processes, including PCIe 6.0/5.0/4.0, DDR5, LPDDR5X/5/4X, MIPI M-PHY G5, eUSB2, USB 3.2/3.1, and DisplayPort enables wide interoperability for commonly used protocols. To accelerate integration of chiplets in multi-die packages, Synopsys UCIe IP has taped out in SF2 and SF4x, and achieved silicon success in SF5A process technologies, to deliver robust die-to-die connectivity with low power and low latency. Synopsys Foundation IP, including embedded memories, logic libraries and GPIOs, is also proven in silicon to deliver leading power, performance, and area in a range of Samsung process technologies.  

Mutual customers can accelerate the development of multi-die designs using Synopsys 3DIC Compiler, a unified exploration-to-signoff platform for 2.5D and 3D heterogeneous integration and advanced packaging. Qualified for Samsung Foundry’s SF2 process, Synopsys 3DIC Compiler supports Samsung’s advanced silicon processes, packaging technologies, and 3DCODE standard. Synopsys is an active member of the Samsung Foundries’ MDI Alliance, helping mutual customers achieve a successful transition to 2.5D and 3D advanced packaging designs.

About Synopsys
Catalyzing the era of pervasive intelligence, Synopsys, Inc. (Nasdaq: SNPS) delivers trusted and comprehensive silicon to systems design solutions, from electronic design automation to silicon IP and system verification and validation. We partner closely with semiconductor and systems customers across a wide range of industries to maximize their R&D capability and productivity, powering innovation today that ignites the ingenuity of tomorrow.  Learn more at www.synopsys.com.

Editorial Contact
Kelli Wheeler 
Synopsys, Inc. 
(650) 584-5000
kelliw@synopsys.com
corp-pr@synopsys.com 

 

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SOURCE Synopsys, Inc.

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Niutech at the Forefront: U.S.-China Circular Economy Forum Tackles “White Pollution”

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BEIJING, Sept. 20, 2024 /PRNewswire/ — On September 6, 2024, the inaugural U.S.-China Circular Economy Cooperation Forum was held in Beijing. The forum, guided by the U.S.-China Climate Action Working Group Circular Economy Task Force, was co-organized by the China Circular Economy Association and the US-China Business Council. The forum brought together approximately 460 distinguished guests from the National Development and Reform Commission of China, the Ministry of Foreign Affairs, the Ministry of Industry and Information Technology, the Ministry of Ecology and Environment, the Ministry of Housing and Urban-Rural Development, the Ministry of Commerce, the General Administration of Market Regulation, the US State Department, the US Department of Energy and other government departments, as well as industry experts, business representatives and scientific research institutions of the two countries. As the domestic leader in continuous pyrolysis technology, Niutech was invited by the China Circular Economy Association to attend the forum and gave an insightful speech on the topic of waste plastic recycling, and the issues of ‘white pollution’ that can result from it.

Enhancing Quality and Efficiency in the Circular Economy with Innovative Forces

The forum was strategically designed to advance the goals outlined in the U.S.-China “The Sunnylands Statement on Enhancing Cooperation to Address the Climate Crisis” (hereinafter referred to as the Sunnylands Statement). It aimed to create a collaborative platform for the business community, social organizations, and research institutions from both countries to foster exchanges and drive tangible cooperation in the circular economy.  

Zhao Chenxin, Deputy Director of the National Development and Reform Commission, John Podesta, Senior Advisor to the U.S. President on International Climate Policy, Liu Zhenmin, China’s Special Envoy for Climate Change Affairs, Nicholas Burns, U.S. Ambassador to China, and Xie Zhenhua, former Special Envoy for Climate Change Affairs of China, attended the opening ceremony of the Forum and delivered a speech, and Xie Feng, Chinese Ambassador to the U.S., made a video message. Deputy Director Zhao Chenxin said that addressing climate change is a common cause for all mankind and cannot be separated from the cooperation between the two global forces, China and the United States.

The China-US Circular Economy Cooperation Forum, held as an initiative to implement the Sunnylands Statement, marked another significant milestone in China-US cooperation on the circular economy. This collaboration is crucial for both nations as they join forces to tackle the climate crisis. On the afternoon of September 6, the forum organized four parallel meetings, where representatives engaged in in-depth exchanges on topics such as using the recycling economy to reduce greenhouse gas emissions, promoting the application of recycled materials, addressing plastic pollution and enhancing recycling, and increasing the recycling value of waste in the context of new industries and consumption patterns.

Niutech: International Experts on Continuous Pyrolysis Technology and Pioneers in solving the global “white pollution” problem

Globally, hundreds of millions of tons of waste plastics are generated annually, yet only about 30% undergo recycling. Traditional physical methods are typically limited to high-value, single-category, and relatively clean waste plastics. However, repeated recycling can degrade the quality of the plastics. Chemical recycling, on the other hand, offers a transformative approach by converting waste plastics into high-value products or fuels through chemical processes, thus overcoming the limitations of physical recycling.

Pyrolysis technology, a cornerstone of chemical recycling, addresses the challenges associated with the material recycling of waste plastics. It is adept at processing various types of low-value, mixed, and contaminated waste plastics. The products of pyrolysis can be further processed to manufacture new plastics, achieving a closed-loop system where waste plastics are repurposed into high-value new plastics. This not only retains the material’s utility at a high level but also converts “white pollution” into a “white oil field,” signifying a major shift in the management and valorization of plastic waste.

At the forum, as the international expert in continuous pyrolysis technology, the corporate representative of Niutech shared the cases of waste plastic chemical recycling projects deployed with international giants BASF and Quantafuel in Denmark, Thailand and other countries. Niutech has developed its own pyrolysis technology and equipment, which they fully own the intellectual property rights to. This technology enables the transformation of low-value, mixed, and contaminated waste plastics—including various polymers such as PP, PE, PS, ABS—into high-quality fuel oil.  

The fuel oil derived from this process can undergo further refining into naphtha, a critical raw material in the production of new plastics. This advanced recycling process not only diverts plastics from landfills and the environment but also contributes to a circular economy by turning waste into a valuable resource.

In the future, Niutech will continue to champion the principle of “green, recycling and low-carbon” waste plastics pyrolysis. Armed with advanced technology, reliable equipment, abundant high-value solutions and proven experience, Niutech is committed to enhancing communication and cooperation with domestic and foreign partners. Together, they will drive forward the chemical recycling of waste plastics and the sustainable development of the global waste plastics recycling industry.

 

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SOURCE Niutech

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Global Ultrasound Institute Launches GUSI Fellowships Platform: Elevating Point-of-Care Ultrasound Education

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SAN FRANCISCO, Sept. 20, 2024 /PRNewswire/ — The Global Ultrasound Institute (GUSI) is proud to announce the launch of the GUSI Fellowships Platform, an innovative online platform designed to empower learners around the world to achieve confidence and competency in point-of-care ultrasound (POCUS). With a holistic, device-independent approach that includes comprehensive evidence-based education, personalized mentorship from world-class POCUS educators, detailed scan review feedback, quantitative assessments, and CME certification, GUSI is setting a new standard in POCUS education.

“GUSI’s online didactics are the best that I have seen. And what I like most about the fellowship were the 1:1 sessions and being able to interact with GUSI expert faculty who have many years of experience in POCUS. And you get to pick their brains and they get to instruct you 1:1. I have used the training I received from GUSI to do much more POCUS clinically and further impact my patients lives.”

Dr. James Wilcox,
Assistant POCUS Director, Indiana University School of Medicine
Adjunct Professor and Assistant Professor of Medicine

“Our mission at GUSI is to democratize access to high-quality ultrasound training,” said Dr. Kevin Bergman and Dr. Mena Ramos, Co-CEOs of Global Ultrasound Institute. “The GUSI Fellowships Platform enables learners from diverse backgrounds to enhance their skills in a supportive, flexible environment, making it easier than ever to reach their POCUS goals.”

With training options covering 38 different scan types, learners can expect personalized 1:1 mentorship with expert POCUS educators who provide timely feedback on practice scans.

“The GUSI fellowship mentors are the best: patient, kind, knowledgeable, experienced, and supportive. GUSI provided education in the areas I wanted and needed to obtain and in my home/office environment not requiring multiple trips around the country. It is not just the way course work is presented – learning is made easier by the support provided to each student.”

Dr. Glenda Patterson
Core Faculty, University of Arkansas Northwest Internal Medicine Residency
Physician, Veterans Health Care of the Ozarks
Board-certified in Internal Medicine, Pulmonary Medicine, and Critical Care Medicine

The GUSI Fellowships Platform features a scalable software system designed to monitor and track performance, ensuring learners can effectively measure their progress.

GUSI understands the challenges faced by healthcare professionals seeking to enhance their ultrasound skills amid demanding schedules. GUSI addresses these concerns with flexible scheduling options, allowing learners to progress at their own pace while balancing their professional and personal commitments. This adaptability and virtual experience is crucial for fostering a culture of continuous learning and skill development.

“I went from not being able to hold the probe to someone who can scan and diagnosing and finding pathologies. I worked with Dr. Milne-Price and she was amazing! She sharpened my skills and we did sessions of live scanning over Zoom. I feel confident in my skills now to scan on my own.”

Dr. Dalea Al-Hawarri
Faculty, Bryn Mawr Family Medicine Residency

As healthcare continues to evolve, the demand for proficient ultrasound practitioners has never been greater. GUSI is not only committed to providing exceptional education but also aims to inspire a new generation of healthcare professionals who can leverage POCUS to improve patient outcomes globally. Join us in this exciting journey towards excellence in ultrasound practice.

For more information on GUSI Fellowships and to start your journey toward ultrasound proficiency, visit https://globalultrasoundinstitute.com/.

About Global Ultrasound Institute:

Global Ultrasound Institute stands at the forefront of point-of-care ultrasound, providing wraparound education, training, AI, and administrative software tools to healthcare providers and health systems globally to lower barriers to POCUS adoption and implementation. GUSI has trained over 14,000 healthcare practitioners in over 60 countries. GUSI is working to create a better world in which every healthcare practitioner is empowered to offer a rapid, reliable, accurate ultrasound-enabled diagnosis directly at the point-of-care, for any patient, anywhere.

For more information about GUSI Fellowships or any of GUSI services, please visit https://globalultrasoundinstitute.com/

Contact:

Dr. Kevin Bergman, Co-Founder, co-CEO, Global Ultrasound Institute
Dr. Mena Ramos, Co-Founder, co-CEO, Global Ultrasound Institute

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SOURCE GLOBAL ULTRASOUND INSTITUTE

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Keuka College Notifies Individuals of Data Security Incident

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KEUKA PARK, N.Y., Sept. 20, 2024 /PRNewswire/ — Keuka College has learned of a data security incident that may have involved personal information.

On April 25, 2024, the College identified suspicious activity within its network environment and immediately took steps to secure the environment, restore its systems, and began an investigation to determine the nature and scope of the issue. Keuka College also engaged independent cybersecurity specialists to assist with the process. The comprehensive investigation, which concluded on August 21, 2024, could not determine definitively whether personal information related to current and former students and employees was affected.

Keuka College maintains a variety of records which can include: name, Social Security number, Driver’s license number, student id number, financial account information, and date of birth. Current students and employees were contacted by the College in May and provided with one year of free credit and identity monitoring services.

Keuka College has established a toll-free call center to answer questions about the incident and address related concerns. Call center representatives are available Monday through Friday from 9:00 am to 9:00 pm Eastern Time and can be reached at 1-833-913-7557. Please be prepared to provide the engagement number, B131983, for reference.

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SOURCE Keuka College

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